10 April 2024Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image
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Makoto Satake, Chisaki Takubo, Tadashi Okumura, Kenji Yasui, Hitoshi Namai, Takahiro Kawasaki, Mayuka Osaki, Maki Tanaka, "Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image," Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129553K (10 April 2024); https://doi.org/10.1117/12.3011778