Characterization of WCx/B4C multilayers sputtered in argon/methane atmospheres

Patrick E. Diehl; Mark W. Lund; David W. Madsen; Larry C. McIntyre Jr.; David J. Smith

doi:10.1117/12.140571

21 January 1993 Characterization of WC_x/B₄C multilayers sputtered in argon/methane atmospheres

Patrick E. Diehl, Mark W. Lund, David W. Madsen, Larry C. McIntyre Jr., David J. Smith

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140571
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

A series of six WC(x)/B4C multilayers was produced by dc magnetron sputtering in an atmosphere of argon with methane additions (from 0 to 15 percent). The microstructure and chemistry of these multilayers was studied using transmission/HREM, XRD, XPS, electron probe microanalysis, and ion beam analysis with MeV helium beams. The multilayers were shown to be completely amorphous. In addition to carbon incorporation, a significant amount of hydrogen was incorporated. The amounts of hydrogen and carbon present increased with the percentage of methane (up to the 12 percent sample), but the atom percent of argon in the multilayers was constant, regardless of the methane concentration. It was found that reflectivity values for Mg K-alpha radiation improved as the methane concentration increased, with the sample produced in a 12 percent methane atmosphere showing the highest reflectivity. Annealing of a representative sample caused a significant loss of hydrogen, and a decrease of the bilayer spacing.

Citation Download Citation

Patrick E. Diehl, Mark W. Lund, David W. Madsen, Larry C. McIntyre Jr., and David J. Smith "Characterization of WC_x/B₄C multilayers sputtered in argon/methane atmospheres", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140571

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