Performance of a 0.5 NA broadband DUV step-and-scan system

Mark William Barrick; Doug Bommarito; Karey L. Holland; Katherine C. Norris; Bob Patterson; Yumiko Takamori; Joseph C. Vigil; Timothy J. Wiltshire

doi:10.1117/12.150455

8 August 1993 Performance of a 0.5 NA broadband DUV step-and-scan system

Mark William Barrick, Doug Bommarito, Karey L. Holland, Katherine C. Norris, Bob Patterson, Yumiko Takamori, Joseph C. Vigil, Timothy J. Wiltshire

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150455
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The Micrascan II is a 0.50 NA DUV, broadband illumination (245 nm to 252 nm) step-and- scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The tool has been designed to provide 350 nm resolution and 90 nm overlay (mean + 3 sigma) in a semiconductor manufacturing environment. The system utilizes a reticle-limited field size of 22.0 X 32.5 mm. Lithographic and system performance testing of pre-production and production versions of the Micrascan II have been performed. Data from the source acceptance testing of the preproduction tool, as well as product level overlay results, are presented. The production tool acceptance test data are also presented along with results of the first SEMATECH marathon cluster test simulating a manufacturing environment. The production tool is integrated with an SVG 90 series track providing all pre-exposure and post-exposure wafer processing. All work reported has been accomplished using 200 mm wafer substrates.

Citation Download Citation

Mark William Barrick, Doug Bommarito, Karey L. Holland, Katherine C. Norris, Bob Patterson, Yumiko Takamori, Joseph C. Vigil, and Timothy J. Wiltshire "Performance of a 0.5 NA broadband DUV step-and-scan system", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150455

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