Photomask Mensuration With The Linear Microdensitometer

Burton D. Figler

doi:10.1117/12.958588

28 May 1980 Photomask Mensuration With The Linear Microdensitometer

Burton D. Figler

Proceedings Volume 0220, Optics in Metrology and Quality Assurance; (1980) https://doi.org/10.1117/12.958588
Event: 1980 Los Angeles Technical Symposium, 1980, Los Angeles, United States

Abstract

Recent improvements to the Aerodyne Linear Microdensitometer have enabled the attainment of ensurational accuracies of 0.025-microns. This accuracy, coupled with optical resolution capabilities of 0.5 to 1.0-microns, permits computerized photomask inspection that allows submicron defect detection with outstanding mensurational accuracy. For photomask line widths on the order of 1-micron, mensurational accuracies of better than 5% of the line width are thus achieved.

Citation Download Citation

Burton D. Figler "Photomask Mensuration With The Linear Microdensitometer", Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); https://doi.org/10.1117/12.958588

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