Ellipsometric measurements on SiO2 by intensity ratio technique

Yu-Faye Chao; C. S. Wei; Wei-Te Lee; Shy Chaung Lin; Tien Sheng Chao

doi:10.1117/12.186666

14 September 1994 Ellipsometric measurements on SiO₂ by intensity ratio technique

Yu-Faye Chao, C. S. Wei, Wei-Te Lee, Shy Chaung Lin, Tien Sheng Chao

Proceedings Volume 2265, Polarization Analysis and Measurement II; (1994) https://doi.org/10.1117/12.186666
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

A PSA photometric ellipsometric technique is used to measure the ellipsometric parameters, (psi) and (Delta) . Taking intensity ratios of A equals I((pi) /4+dp,dA)/I((pi) 4+dp/,(pi) 2+dA) and B equals I(-(pi) /4+dp,dA)/I(-(pi) /4+dp,(pi) /2+dA) to their first order approximation under small azimuth deviations of polarizer (dp) and analyzer (dA), we find that at fixed dA these two ratios have opposite gradient with respect to dp and intersect to each other at a special dp where Aequals B EQ tan²(psi) , and the position of this dp is linearly related to cos (Delta) . For comparison, (psi) and (Delta) of a SiO2/Si thin film are measured by conventional null ellipsometry and intensity ratio technique. An higher percentage error on (Delta) is expected for this PSA system. The source of errors will be discussed.

Citation Download Citation

Yu-Faye Chao, C. S. Wei, Wei-Te Lee, Shy Chaung Lin, and Tien Sheng Chao "Ellipsometric measurements on SiO₂ by intensity ratio technique", Proc. SPIE 2265, Polarization Analysis and Measurement II, (14 September 1994); https://doi.org/10.1117/12.186666

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