Methods of error source identification and process optimization for photomask manufacturing

Mark D. Cerio

doi:10.1117/12.212766

3 July 1995 Methods of error source identification and process optimization for photomask manufacturing

Mark D. Cerio

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212766
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

The optimization of a manufacturing process for linewidth uniformity is dependent on the ability to identify and eliminate the major sources of systematic error. When investigating a process composed of many individual sequential steps, it is necessary to decouple these steps and determine the relative magnitude of their contributions. Often, classical approaches in experimental design are either inappropriate or prohibitively expensive. Alternative statistical methods exist which provide sufficient accuracy of results with limited sample sizes and cost effectiveness.

Citation Download Citation

Mark D. Cerio "Methods of error source identification and process optimization for photomask manufacturing", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212766

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