Paper
22 December 1998 Step-flow growth of perovskite PbTiO3 thin films epitaxially grown on a miscut SrTiO3 substrate
Kiyotaka Wasa, Yoko Haneda, Toshifumi Sato, Hideaki Adachi, Isaku Kanno, Darrell G. Schlom, Susan Trolier-McKinstry, Qing Gang, Chang-Beom Eom
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Abstract
Continuous single crystal (001)PbTiO3 thin films under a step-flow growth mode were epitaxially grown on the miscut (001)SrTiO3 substrate with miscut angle of 1.7 degrees. A planar magnetron sputtering system was used for the epitaxial growth. The film thickness was ranged from 5 to 250 nm. The surface of the sputtered PbTiO3 thin films comprised periodic striped patterns with step lines and atomically flat terraces. The typical step height and terrace width were 3 nm and 200 nm, respectively. The partial oxygen pressure during sputtering deposition affected the stability of the step-flow growth mode. Lower partial oxygen pressure stabilized the step-flow growth mode resulting in a layer growth. The PT thin films include the stress due to the tetragonal lattice deformation.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kiyotaka Wasa, Yoko Haneda, Toshifumi Sato, Hideaki Adachi, Isaku Kanno, Darrell G. Schlom, Susan Trolier-McKinstry, Qing Gang, and Chang-Beom Eom "Step-flow growth of perovskite PbTiO3 thin films epitaxially grown on a miscut SrTiO3 substrate", Proc. SPIE 3481, Superconducting and Related Oxides: Physics and Nanoengineering III, (22 December 1998); https://doi.org/10.1117/12.335874
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Cited by 2 scholarly publications.
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KEYWORDS
Thin films

Crystals

Sputter deposition

Oxygen

Perovskite

Thin film growth

Transmission electron microscopy

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