Multiple-level technique for high-resolution OVDs fabrication

Laura Luciani; Michela Casini

doi:10.1117/12.380009

17 March 2000 Multiple-level technique for high-resolution OVDs fabrication

Laura Luciani, Michela Casini

Proceedings Volume 3956, Practical Holography XIV and Holographic Materials VI; (2000) https://doi.org/10.1117/12.380009
Event: Electronic Imaging, 2000, San Jose, CA, United States

Abstract

A multiple-level technique suitable to obtain high efficient Optically Variable Device is presented. The target is the realization of a very complex holographic images with various kinetic and dynamic effects, of interest for the application in the security market. The technique, involving the use of a positive and a negative photoresist process, and its application for the fabrication of complex diffraction gratings are described.

Citation Download Citation

Laura Luciani and Michela Casini "Multiple-level technique for high-resolution OVDs fabrication", Proc. SPIE 3956, Practical Holography XIV and Holographic Materials VI, (17 March 2000); https://doi.org/10.1117/12.380009

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