Paper
5 July 2000 Fabrication of small contact using practical pupil filtering
Hoyoung Kang, Bruce W. Smith
Author Affiliations +
Abstract
Fabrication of small contacts is one of the most important challenges of semiconductor lithography. The use of Bessel contact, pupil filtering or phase shift mask has been suggested by various groups, however those were not easily applicable. Currently, only an attenuated has shift mask has been demonstrated as a useful enhancement approach for contact level lithography. As a practical pupil filtering method, a pellicle plane angular transmission filter is suggested. An angular transmission filter can be realized using multiple dielectric organic or inorganic coatings on glass or membrane substrates. Filter have been designed and fabricated for high NA DUV lithography and initial filter fabrication and exposure evaluation have been carried out. Lithographic results shown up to 20 percent improvement of minimum contact size for dense contacts, and some improvement for isolated and semi-dense contacts. With further optimization of filter, it is expected to have better results with matched lithography set with filter.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hoyoung Kang and Bruce W. Smith "Fabrication of small contact using practical pupil filtering", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388944
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Cited by 4 scholarly publications.
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KEYWORDS
Lithography

Photomasks

Deep ultraviolet

Optical filters

Pellicles

Phase shifts

Image filtering

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