Next-generation lithography mask inspection

Noah Bareket; Steve Biellak; Donald W. Pettibone; Stanley E. Stokowski

doi:10.1117/12.392104

19 July 2000 Next-generation lithography mask inspection

Noah Bareket, Steve Biellak, Donald W. Pettibone, Stanley E. Stokowski

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392104
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

KLA-Tencor and industry partners are collaborating on a project for developing early capabilities of inspecting NGL masks. The project, partially funded by NIST as part of the ATP program, is focusing on building a research tool that will provide experimental data for development of a production capable tool. Some of the key technical issues include contrast in transmission and reflection, defect sources and types, and maintaining mask cleanliness in the absence of pellicles. The masks need to be inspected at multiple process stages, starting with unpatterned substrates, and ending with the pattern inspection. System issues include defect sensitivity and inspection time, which need to be balanced.

Citation Download Citation

Noah Bareket, Steve Biellak, Donald W. Pettibone, and Stanley E. Stokowski "Next-generation lithography mask inspection", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392104

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