New procedure for the optical characterization of high-quality thin films

Salvador Bosch; Norbert Leinfellner; Etienne Quesnel; Angela Duparre; Josep Ferre-Borrull; Stefan Guenster; Detlev Ristau

doi:10.1117/12.405812

2 November 2000 New procedure for the optical characterization of high-quality thin films

Salvador Bosch, Norbert Leinfellner, Etienne Quesnel, Angela Duparre, Josep Ferre-Borrull, Stefan Guenster, Detlev Ristau

Author Affiliations +

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405812
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

The optical characterization of materials in thin film phase is a standard task in the field of coating technology. One typical problem is the optical characterization of a single layer of material deposited on a well-known substrate. Provided the physical model considered for the modeling is correct and the available experimental date (usually spectrophotometric or ellipsometric spectra) are accurate, a precise optical characterization is quite straightforward. However, there are experimental circumstances where several samples have been coated under very well defined conditions. As when they have been obtained in the same coating run, so that no differences are expected due to the positions of each individual sample inside the chamber during the deposition process. The aim of this work is to present an improved procedure for the optical characterization of the material deposited under the very well controlled conditions explained above. The basis of our method is to use the a priori information about the identical nature of all the samples, introducing all the spectrophotometric and/or ellipsometric data available from optical properties of the layers, as compared with the separate (individual) characterization of the samples. We will illustrate our procedures for MgF₂ films in the range 200-800 nm.

Citation Download Citation

Salvador Bosch, Norbert Leinfellner, Etienne Quesnel, Angela Duparre, Josep Ferre-Borrull, Stefan Guenster, and Detlev Ristau "New procedure for the optical characterization of high-quality thin films", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405812

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available