AFM data analysis: separating surface microtopography from instrumental artifacts

Dorothee Hueser; Hendrik Rothe

doi:10.1117/12.401656

26 September 2000 AFM data analysis: separating surface microtopography from instrumental artifacts

Dorothee Hueser, Hendrik Rothe

Proceedings Volume 4100, Scattering and Surface Roughness III; (2000) https://doi.org/10.1117/12.401656
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

It is well known that functional surfaces in microelectronics and optics can be inspected very fast with scatterometers or scatter sensors. However, there is an increasing interest in looking at specific sample areas in more detail, i.e., the micro topography of the surface has to be measured. Since far-field optical profilers are diffraction limited, the means of choice are very often Scanning Probem Microscopes (SPMs), and namely, Atomic Force Microscopes (AFMs). Various methods for processing data obtained by AFMs will be discussed. An AFM measurement should deliver the surface micro topography to enable the determination of characteristic values, in particular rms roughness. Normally, a superposition of the surface characteristics and artifacts due to the AFM is obtained.

Citation Download Citation

Dorothee Hueser and Hendrik Rothe "AFM data analysis: separating surface microtopography from instrumental artifacts", Proc. SPIE 4100, Scattering and Surface Roughness III, (26 September 2000); https://doi.org/10.1117/12.401656

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