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2 October 2001 Parametric yield enhancement of a microresonator using statistical optimization tools
Flavien Delauche, Bachar Affour, Christian Dufaza
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Proceedings Volume 4558, Reliability, Testing, and Characterization of MEMS/MOEMS; (2001) https://doi.org/10.1117/12.443014
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Abstract
High volume ICs production companies (telecom, etc) show a growing interest in MEMS components, especially RF and optical ones. Prototypes of integrated inductances and optical switches demonstrate very promising performances. The transition to the high volume production implies the development of Design For Manufacturability (DFM) tools featured to handle MEMS specific processes and related problems such as yield loss due to process dispersion. These tools must be part of a MEMS dedicated CAD environment. This paper presents results of what could be yield enhancement using usual statistical optimization tools and methods, and a new approach currently developed by MEMSCAP and LIRMM, based on response variability minimization.
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Flavien Delauche, Bachar Affour, and Christian Dufaza "Parametric yield enhancement of a microresonator using statistical optimization tools", Proc. SPIE 4558, Reliability, Testing, and Characterization of MEMS/MOEMS, (2 October 2001); https://doi.org/10.1117/12.443014
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KEYWORDS
Microelectromechanical systems
Optimization (mathematics)
Computer aided design
Diffractive optical elements
Microresonators
Monte Carlo methods
Resonators
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