Physical properties of the HCT EUV source

Joseph Pankert; Klaus Bergmann; J. Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther H. Derra

doi:10.1117/12.472271

1 July 2002 Physical properties of the HCT EUV source

Joseph Pankert, Klaus Bergmann, J. Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther H. Derra

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472271
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The paper describes the physical properties and recent technical advances of the hollow cathode triggered pinch device (HCT) for the generation of EUV radiation. In previous publications we have demonstrated continuous operation of the untriggered device at 1 kHz in pure Xe. The newer generations operate with a triggering facility which allows a wider parameter space under which stable operation is possible. Repetition frequencies of up to 4 kHz could be demonstrated. Many of the experiments are performed in repetitive bursts of variable lengths and spacing. This allows also to demonstrate that there is only little transient behavior upon switching on and off the source. Conversion efficiencies into the 2 percent frequency band around 13.5 nm are about 0.4 percent in 2p, comparable to the values reported from other groups. Another important parameter is the size of the light emitting region. Here we have studied the influence of electrode geometry and flow properties on the size, to find a best match to the requirements of the collection optics. A major problem for the design of a complete wafer illumination system is the out-of-band portion of the radiation. Especially the DUV fraction of the source spectrum is a concern because it is also reflected to some extend by the Mo-Si multilayer mirrors. We show that the source has a low overall non-EUV part of the emission. In particular, it is demonstrated that there is very little DUV coming out of the usable source volume, well below the specified level.

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Joseph Pankert, Klaus Bergmann, J. Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Rolf Apetz, Jeroen Jonkers, Michael Loeken, and Guenther H. Derra "Physical properties of the HCT EUV source", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472271

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