Laser micromachining of optical materials with a 157-nm fluorine laser

Jako Greuters; Nadeem Hasan Rizvi

doi:10.1117/12.468234

15 April 2003 Laser micromachining of optical materials with a 157-nm fluorine laser

Jako Greuters, Nadeem Hasan Rizvi

Proceedings Volume 4941, Laser Micromachining for Optoelectronic Device Fabrication; (2003) https://doi.org/10.1117/12.468234
Event: Photonics Fabrication Europe, 2002, Bruges, Belgium

Abstract

Vacuum UV laser micromachining is used to produce microstructures in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.

Citation Download Citation

Jako Greuters and Nadeem Hasan Rizvi "Laser micromachining of optical materials with a 157-nm fluorine laser", Proc. SPIE 4941, Laser Micromachining for Optoelectronic Device Fabrication, (15 April 2003); https://doi.org/10.1117/12.468234

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