Lithographic tradeoffs between different assist feature OPC design strategies

James C. Word; Siuhua Zhu

doi:10.1117/12.485326

10 July 2003 Lithographic tradeoffs between different assist feature OPC design strategies

James C. Word, Siuhua Zhu

Proceedings Volume 5042, Design and Process Integration for Microelectronic Manufacturing; (2003) https://doi.org/10.1117/12.485326
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

In recent years many of the problems associated with the use of assist features have been partially or completely resolved. Such issues include mask manufacturing and inspection, software maturity, and the so-called forbidden pitch problem. Still, the lithographer is faced with numerous choices in developing production worthy assist feature designs. This paper will examine some of the choices, and the tradeoffs associated with each. In particular the choice between simple 1D scatter bar designs and various 2D designs will be explored to determine the tradeoffs with lithographic performance. A DRC (Design Rule Check)-driven technique has been developed to highlight potential shortcomings of each individual design strategy. The lithographic impact of these shortcomings has been confirmed with on-Silicon process data.

Citation Download Citation

James C. Word and Siuhua Zhu "Lithographic tradeoffs between different assist feature OPC design strategies", Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); https://doi.org/10.1117/12.485326

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