A review of the emerging SEMI standards for particle scanners

John C. Stover

doi:10.1117/12.519111

4 November 2003 A review of emerging SEMI standards for particle scanners

John C. Stover

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.519111
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A suite of SEMI standards is emerging with new specifications for the calibration of particle scanners used in the semiconductor industry. The four documents specify the characteristics required of PSL sphere depositions to be used for calibration, the manner in which capture rate is calculated, the method used for scanner calibration and a check for deposition system use. This paper overviews the background technology as well as the struggle of various industry segments as they worked out the key requirements of these documents.

Citation Download Citation

John C. Stover "A review of emerging SEMI standards for particle scanners", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.519111

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