Near-field multiphoton nanolithography using an apertureless optical probe

Xiaobo Yin; Nicholas Fang; Xiang Zhang; Ignacio B. Martini; Benjamin J. Schwartz

doi:10.1117/12.510920

3 November 2003 Near-field multiphoton nanolithography using an apertureless optical probe

Xiaobo Yin, Nicholas Fang, Xiang Zhang, Ignacio B. Martini, Benjamin J. Schwartz

Proceedings Volume 5211, Nonlinear Optical Transmission and Multiphoton Processes in Organics; (2003) https://doi.org/10.1117/12.510920
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Near-field multiphoton optical lithography is demonstrated by using ~120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produce the lithographic features with ~ 70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale multiphoton absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of two smaller than the previous multiphoton lithography in the far field.

Citation Download Citation

Xiaobo Yin, Nicholas Fang, Xiang Zhang, Ignacio B. Martini, and Benjamin J. Schwartz "Near-field multiphoton nanolithography using an apertureless optical probe", Proc. SPIE 5211, Nonlinear Optical Transmission and Multiphoton Processes in Organics, (3 November 2003); https://doi.org/10.1117/12.510920

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