Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

Robert Wuest; Christoph Hunziker; Franck Robin; Patric Strasser; Daniel Erni; Heinz Jackel

doi:10.1117/12.522316

25 March 2004 Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

Robert Wuest, Christoph Hunziker, Franck Robin, Patric Strasser, Daniel Erni, Heinz Jackel

Proceedings Volume 5277, Photonics: Design, Technology, and Packaging; (2004) https://doi.org/10.1117/12.522316
Event: Microelectronics, MEMS, and Nanotechnology, 2003, Perth, Australia

Abstract

We investigate the patterning-accuracy limits of proximity-effect corrected (PEC) electron-beam lithography applied to the fabrication of photonic crystals (PhC's). Energy-intensity distribution simulations reveal that conventional dose-modulation PEC techniques present a lower limit of the best attainable hole-radius variation of approximately 1% for a generic PhC structure, while a PEC method proposed by Watson theoretically should yield perfect correction. Simulation results were verified experimentally and additionally we introduce a new method to determine the beam-broadening parameter α. We analyzed the impact of geometrical key parameters of PhC's on achievable patterning accuracy and showed that proximity effects impose severe limitations on the patterning of structures with large filling factors and/or small lattice constants. Furthermore, we performed a sensitivity analysis on the proximity parameters and showed that overestimation of the backscatter efficiency can actually improve the lithographic accuracy and mimic the Watson-PEC method to a certain degree.

Citation Download Citation

Robert Wuest, Christoph Hunziker, Franck Robin, Patric Strasser, Daniel Erni, and Heinz Jackel "Limitations of proximity-effect correction for electron-beam patterning of photonic crystals", Proc. SPIE 5277, Photonics: Design, Technology, and Packaging, (25 March 2004); https://doi.org/10.1117/12.522316

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available