Improved vapor-phase deposition technique for antistiction monolayers

Robert W. Ashurst; Carlo Carraro; Jeff D. Chinn; Victor Fuentes; Boris Kobrin; Roya Maboudian; Romuald Nowak; Richard Yi

doi:10.1117/12.531798

30 December 2003 Improved vapor-phase deposition technique for antistiction monolayers

Robert W. Ashurst, Carlo Carraro, Jeff D. Chinn, Victor Fuentes, Boris Kobrin, Roya Maboudian, Romuald Nowak, Richard Yi

Author Affiliations +

Proceedings Volume 5342, Micromachining and Microfabrication Process Technology IX; (2003) https://doi.org/10.1117/12.531798
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

We have developed an improved vapor-phase deposition method and an apparatus for the wafer-scale coating of monolayer films typically used in anti-stiction applications. The method consists of a surface preparation step using an O₂ plasma followed by the tunable deposition of a monolayer film in the same reactor. This process has been successfully applied to MEMS test structures and has demonstrated superior anti-stiction performance. The deposition process allows tuning of the film properties by the precise metering of the precursor and a catalyst as part of the process control scheme. The anti-stiction monolayer film deposited from dimethyldichlorosilane (DDMS), tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS), and heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane (FDTS) were characterized using contact angle analysis, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The coefficient of static friction was measured using a sidewall test device and the work of adhesion using a cantilever beam array. The results showed that excellent quality, uniformity, and reproducibility could be achieved across a whole wafer using this method and equipment.

Citation Download Citation

Robert W. Ashurst, Carlo Carraro, Jeff D. Chinn, Victor Fuentes, Boris Kobrin, Roya Maboudian, Romuald Nowak, and Richard Yi "Improved vapor-phase deposition technique for antistiction monolayers", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.531798

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