Assessment of 5-pole illumination for 65nm-node contact holes

Francois Weisbuch; Scott Warrick; Will Conley; Jerome Depre

doi:10.1117/12.599760

12 May 2005 Assessment of 5-pole illumination for 65nm-node contact holes

Francois Weisbuch, Scott Warrick, Will Conley, Jerome Depre

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.599760
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The greatest challenge for 65-nm contact holes and via printing is ensuring an acceptable process window (250-nm DoF @ 8% EL) for a wide range of pitches with a MEEF lower than 3.5. To print dense contact holes / vias with a CD less than 100-nm, very high Numerical Apertures (≥ 0.85) are required. Consequently DoF through pitch is dramatically reduced, such that it becomes absolutely necessary to develop new techniques to enhance process latitude. In this paper, we will study the use of customized illuminations formed by combination of small radius conventional illumination and quasar. Generically, this type of illumination is commonly referred to as 5-pole illumination. Specifically this paper, the “windmill” and “soft quasar” options are investigated. These designs are based upon the assumption, that there is a way to optimize for all pitches, the imaging lens pupil filling with diffracted orders. Using a combination of aerial image simulations and experimental (double) exposures, the optimal 5-pole illumination designs are derived, with their simulated performance being compared to conventional illumination settings. For the optimised designs, experimental data is presented for “real” device structures based on the Crolles2 65-nm technology design rules.

Citation Download Citation

Francois Weisbuch, Scott Warrick, Will Conley, and Jerome Depre "Assessment of 5-pole illumination for 65nm-node contact holes", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599760

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