Surface processing with sulfonic acid for quantum dot and its characteristics

Amane Shiohara; Noriyoshi Manabe; Kenji Yamamoto M.D.

doi:10.1117/12.645494

27 March 2006 Surface processing with sulfonic acid for quantum dot and its characteristics

Amane Shiohara, Noriyoshi Manabe, Kenji Yamamoto M.D.

Proceedings Volume 6096, Colloidal Quantum Dots for Biomedical Applications; 60961G (2006) https://doi.org/10.1117/12.645494
Event: SPIE BiOS, 2006, San Jose, California, United States

Abstract

We developed the smaller sized quantum dots covered with sodium 2-mercaptoethanesulfonate which has a sulfonyl group (QDs-SO₃-), and compared its stability in acid, salt and buffer solutions with that of the quantum dots covered with the mercaptoundecanoic acid (QDs-MUA) and covered with the NH₂ group (QDs-NH₂). We found that the QD-SO₃- well disperses in these solutions without quenching and this stability holds on 24 hours. Next, we observed the cell damage caused by the quantum dots. In the evaluation of cell damage, QD-SO₃- did not show noticeable cell damage in the 0.2mg/mL by the comet assay as well as QD-MUA and QD-NH₂ in the same concentration. All these results could suggest that SO₃- might be useful for the biomedical engineering.

Citation Download Citation

Amane Shiohara, Noriyoshi Manabe, and Kenji Yamamoto M.D. "Surface processing with sulfonic acid for quantum dot and its characteristics", Proc. SPIE 6096, Colloidal Quantum Dots for Biomedical Applications, 60961G (27 March 2006); https://doi.org/10.1117/12.645494

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