Thermal management design and verification of collector optics into high-power EUV source systems

Giovanni Bianucci; Fabio E. Zocchi; Giorgio Pirovano; Gian Luca Cassol; Fabio Marioni; Pietro Binda; Luca Porreca; Imtiaz Ahmad; Denis Bolshukhin; Max C. Schürmann

doi:10.1117/12.712241

15 March 2007 Thermal management design and verification of collector optics into high-power EUV source systems

Giovanni Bianucci, Fabio E. Zocchi, Giorgio Pirovano, Gian Luca Cassol, Fabio Marioni, Pietro Binda, Luca Porreca, Imtiaz Ahmad, Denis Bolshukhin, Max C. Schürmann

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171S (2007) https://doi.org/10.1117/12.712241
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A dual-mirror grazing incidence collector produced by Media Lario Technologies was integrated into a high-power, Xefueled gas discharge produced plasma (GDPP) source test stand at XTREME technologies, and tested at power levels responding to the productivity demands of the extreme ultra-violet (EUV) lithography beta exposure systems. The test campaign conducted at different source repetition rates in steady state and transient operating modes provided data for the verification and improvement of the thermo-optical model of the source-DMT-collector system used for the thermooptical design of the collector. The final thermo-optical model of the steady state regime was cross-validated by the numerical solution of the transient tests, which is solely based on the experimental temperature readings. Among the salient results, the cooling system integrated on the collector removed the 1 kW heat load absorbed by the dual-mirror optics, maintaining the temperature of the optics within 20-25 °C temperature range, with an input cooling water temperature of 18.6 °C. Additional validation came from tests performed on a single-mirror collector in a vacuum based, thermo-optical visible test bench installed at Media Lario Technologies, which provided a closed loop validation of the thermal budget, finite element model, and Monte Carlo ray tracing optical prediction.

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Giovanni Bianucci, Fabio E. Zocchi, Giorgio Pirovano, Gian Luca Cassol, Fabio Marioni, Pietro Binda, Luca Porreca, Imtiaz Ahmad, Denis Bolshukhin, and Max C. Schürmann "Thermal management design and verification of collector optics into high-power EUV source systems", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171S (15 March 2007); https://doi.org/10.1117/12.712241

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