High power holographic masks for beam shaping

William Parker

doi:10.1117/12.732262

12 September 2007 High power holographic masks for beam shaping

William Parker

Proceedings Volume 6663, Laser Beam Shaping VIII; 66630G (2007) https://doi.org/10.1117/12.732262
Event: Photonic Devices + Applications, 2007, San Diego, California, United States

Abstract

A new class of optically generated holographic projection masks is reported that shapes a high power laser beam into any number of image forming sub-beams. Unlike computer generated holograms or TIR volume holography approaches, the work reported here involves a phase only transmission in-line optical hologram to shape beams and image patterns on a workpiece. By combining the functions of beam homogenizer, mask and projection lens into a single in-line optical element, this approach yields a highly efficient but greatly simplified lithography system for ablation patterning. A lower cost ablation process tool with throughput 10-100 times that of existing tools is one result. This report examines the use of high power holographic projection masks to replace traditional reflective photomasks and the associated projection imaging optics currently used in laser ablation systems. A holographic projection mask also exhibits image redundancy, reducing the need for beam homogenization and increasing its resistance to print defects produced by contamination or damage.

Citation Download Citation

William Parker "High power holographic masks for beam shaping", Proc. SPIE 6663, Laser Beam Shaping VIII, 66630G (12 September 2007); https://doi.org/10.1117/12.732262

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