Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources

Matus Banyay; Larissa Juschkin

doi:10.1117/12.793364

3 September 2008 Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources

Matus Banyay, Larissa Juschkin

Author Affiliations +

Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 707714 (2008) https://doi.org/10.1117/12.793364
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

The use of extreme ultraviolet radiation (XUV/EUV) enables a variety of new optical and analytical techniques such as EUV-lithography, -microscopy but also -reflectometry. Due to the strong interaction of XUV with matter, grazing-incidence reflectometry in the 1-40 nm range has proven to be a surface sensitive technique to characterize thin-film structures on the nanometer scale. Chemical composition, thickness and surface roughness of a deposited layer system can be determined indirectly from its reflectivity curve by non-linear regression techniques and the combined Nevot Croce- and general transfer matrix formalism for X-ray reflectivity. Here the reflectivity can either be determined as a function of incident wavelength at a fixed grazing angle or vice versa. This way it is even possible to specify a root-mean-square (rms) surface roughness of hidden layer-interfaces in the depth of a stack. To date, such measurements in the XUV have only been carried out at synchrotron facilities prohibiting an easy access to a broad range of users. Taking into account the recent progress in the development of short wavelength sources and optics, laboratory-scale, plasma-based XUV light-sources are becoming an attractive option for compact devices. Along with our simulations we present our experimental work on an off-synchrotron XUV-reflectometer for characterization of thin-film structures. The device can also be utilized to carry out scattered light measurements from ultra smooth surfaces, e.g. wafers, for defect inspection.

Citation Download Citation

Matus Banyay and Larissa Juschkin "Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707714 (3 September 2008); https://doi.org/10.1117/12.793364

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