Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

K. Murakami; T. Yamaguchi; A. Yamazaki; N. Kandaka; M. Shiraishi; S. Matsunari; T. Aoki; S. Kawata

doi:10.1117/12.846676

22 March 2010 Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76361U (2010) https://doi.org/10.1117/12.846676
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Dedicate beam line for R&D on contamination of EUV exposure tools (BL18) was constructed at Saga Light Source (SAGA-LS) and its operation has been started. BL18 has an advantage of long time exposure, which gives accurate data compared with high-EUV-intensity and short-time experiments using an undulator beam line at New SUBARU synchrotron facility. Carbon contamination growth under low irradiance EUV radiation with fluorocarbon gas injection was examined using Mo/Si multilayer mirror samples. In the EUV intensity region from 11 W/cm² to 0.01 W/cm², degradation rate of reflectivity did not depend on the EUV intensity. The degradation rate was proportional to the EUV intensity in the range of less than 0.01 W/cm². Carbon contamination due to resist outgas during EUV exposure was also investigated.

Citation Download Citation

K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, and S. Kawata "Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361U (22 March 2010); https://doi.org/10.1117/12.846676

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