Paper
29 July 2010 Improved EUV filter transmission with plasma cleaning
Bruce M. Lairson, Dave Grove, Ryan Smith, Heidi Lopez, Travis Ayers, Brennan L. Gantner, Matthew N. Beasley
Author Affiliations +
Abstract
As-fabricated free-standing indium foils were found to have transmission in the 90nm to 120nm band ranging from 10% to 70% of modeled values based on pure indium. Auger depth profiling of the as-deposited indium showed little surface contamination and high purity. However, final freestanding filters were found to have heavy contamination, particularly on the surface. An argon/hydrogen plasma bombardment was developed which improved EUV transmission by 50% to 500% in the finished filters without causing significant pinholes to develop in the foils or appreciably affecting blocking characteristics.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce M. Lairson, Dave Grove, Ryan Smith, Heidi Lopez, Travis Ayers, Brennan L. Gantner, and Matthew N. Beasley "Improved EUV filter transmission with plasma cleaning", Proc. SPIE 7732, Space Telescopes and Instrumentation 2010: Ultraviolet to Gamma Ray, 77322G (29 July 2010); https://doi.org/10.1117/12.857739
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Cited by 2 scholarly publications.
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KEYWORDS
Indium

Plasma

Semiconducting wafers

Contamination

Extreme ultraviolet

Absorption

Argon

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