A study and simulation of the impact of high-order aberrations to overlay error distribution

G. Sun; F. Wang; C. Zhou

doi:10.1117/12.879365

20 April 2011 A study and simulation of the impact of high-order aberrations to overlay error distribution

G. Sun, F. Wang, C. Zhou

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 79712K (2011) https://doi.org/10.1117/12.879365
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

With reduction of design rules, a number of corresponding new technologies, such as i-HOPC, HOWA and DBO have been proposed and applied to eliminate overlay error. When these technologies are in use, any high-order error distribution needs to be clearly distinguished in order to remove the underlying causes. Lens aberrations are normally thought to mainly impact the Matching Machine Overlay (MMO). However, when using Image-Based overlay (IBO) measurement tools, aberrations become the dominant influence on single machine overlay (SMO) and even on stage repeatability performance. In this paper, several measurements of the error distributions of the lens of SMEE SSB600/10 prototype exposure tool are presented. Models that characterize the primary influence from lens magnification, high order distortion, coma aberration and telecentricity are shown. The contribution to stage repeatability (as measured with IBO tools) from the above errors was predicted with simulator and compared to experiments. Finally, the drift of every lens distortion that impact to SMO over several days was monitored and matched with the result of measurements.

Citation Download Citation

G. Sun, F. Wang, and C. Zhou "A study and simulation of the impact of high-order aberrations to overlay error distribution", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79712K (20 April 2011); https://doi.org/10.1117/12.879365

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