Study on range selection of key parameters in bonnet polishing using FEA

Ri Pan; Zhen-zhong Wang; Dong-xu Zhang; Chun-jin Wang; Yin-hui Xie; Yinbiao Guo

doi:10.1117/12.970530

16 October 2012 Study on range selection of key parameters in bonnet polishing using FEA

Ri Pan, Zhen-zhong Wang, Dong-xu Zhang, Chun-jin Wang, Yin-hui Xie, Yinbiao Guo

Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 841613 (2012) https://doi.org/10.1117/12.970530
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Bonnet polishing system is mostly used in rough polishing and fine polishing because of its own features. Due to different aims of polishing stages, optimal ranges of key parameters are different in various polishing stages. Simulations in ANSYS are present in order to get optimal ranges of key parameters including inner pressure P and compression of bonnet H in different polishing stages, firstly, the reliability of simulation of bonnet polishing using ANSYS is verified through a series of simulation about fine polishing stage, on the condition of using ranges of key parameters got by former researchers from polishing experiment; secondly, simulations about rough polishing were carried out, and optimal ranges of key parameters were found, which have reference value in future work.

Citation Download Citation

Ri Pan, Zhen-zhong Wang, Dong-xu Zhang, Chun-jin Wang, Yin-hui Xie, and Yinbiao Guo "Study on range selection of key parameters in bonnet polishing using FEA", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 841613 (16 October 2012); https://doi.org/10.1117/12.970530

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