Paper
26 September 2013 High contrast internal and external coronagraph masks produced by various techniques
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Abstract
High contrast internal and external coronagraphic imaging requires a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunjithapatham Balasubramanian, Daniel Wilson, Victor White, Richard Muller, Matthew Dickie, Karl Yee, Ronald Ruiz, Stuart Shaklan, Eric Cady, Brian Kern, Ruslan Belikov, Olivier Guyon, and N. Jeremy Kasdin "High contrast internal and external coronagraph masks produced by various techniques ", Proc. SPIE 8864, Techniques and Instrumentation for Detection of Exoplanets VI, 88641R (26 September 2013); https://doi.org/10.1117/12.2024615
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Cited by 12 scholarly publications.
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KEYWORDS
Photomasks

Coronagraphy

Silicon

Reflectivity

Deep reactive ion etching

Ion beams

Electron beam lithography

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