Isotropic sub-100nm direct laser writing using spherical reflector-enabled 4Pi excitation at 405nm wavelength

Lukas Payne; Joseph Askey; Ioannis Pitsios; Sam Ladak; Wolfgang Langbein

doi:10.1117/12.3021957

18 June 2024 Isotropic sub-100nm direct laser writing using spherical reflector-enabled 4Pi excitation at 405nm wavelength

Lukas Payne, Joseph Askey, Ioannis Pitsios, Sam Ladak, Wolfgang Langbein

Author Affiliations +

Proceedings Volume PC12995, 3D Printed Optics and Additive Photonic Manufacturing IV; PC1299502 (2024) https://doi.org/10.1117/12.3021957
Event: SPIE Photonics Europe, 2024, Strasbourg, France

Abstract

We demonstrate a direct laser writing setup combining 405 nm multi-photon lithography with 4Pi excitation enabled by a spherical reflector (SR) refocussing the transmitted excitation. The SR provides a simplified implementation of the 4Pi geometry, avoiding the need for an additional objective and its interferometrically stabilised excitation beam path, while also recycling the beam power. The reflected beam position is measured by imaging the reflected beam and is controlled by a feedback loop to 10nm in all three dimensions. Using this instrument, the fabrication of sinusoidally modulated nanowires and helicoids with sub-100nm near-isotropic cross-section is demonstrated.

Conference Presentation

Citation Download Citation

Lukas Payne, Joseph Askey, Ioannis Pitsios, Sam Ladak, and Wolfgang Langbein "Isotropic sub-100nm direct laser writing using spherical reflector-enabled 4Pi excitation at 405nm wavelength", Proc. SPIE PC12995, 3D Printed Optics and Additive Photonic Manufacturing IV, PC1299502 (18 June 2024); https://doi.org/10.1117/12.3021957

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