kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

Akira Endo; Martin Smrž; Jiří Mužík; Ondřej Novák; Michal Chyla; Tomáš Mocek

doi:10.1117/1.JMM.16.4.041011

24 November 2017 kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 4, 041011 (November 2017). https://doi.org/10.1117/1.JMM.16.4.041011

Abstract

The technology for extreme ultraviolet (EUV) lithography sources is maturing. Laser produced plasma (LPP) sources with usable power >100 W have been used in high-volume manufacturing (HVM) applications, and 250-W sources are expected to be introduced in HVM soon. However, a further increase of power and cleanness may benefit a powerful picosecond (ps) laser in the near-infrared and wavelength converted spectral region. The HiLASE Centre has been working in thin-disc laser technology and has demonstrated a 0.5-kW platform Perla-C based on a very compact Yb:YAG regenerative amplifier. 100-kHz ps operation has been achieved with a fundamental spatial mode and excellent long-term pointing and energy stability. It is reported on a thin-disc-based ps Yb:YAG solid-state laser technology platform Perla developed in the Czech Republic and the present performance of delivering >4 mJ, <2-ps pulses at a 100-kHz repetition rate with the potential to be upgraded to 1 kW of average power and 1-MHz pulse repetition rate. The ps laser extendibility is important for kW-class LPP sources and controlled free electron laser EUV sources in 10-kW power region.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

Citation Download Citation

Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, and Tomáš Mocek "kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(4), 041011 (24 November 2017). https://doi.org/10.1117/1.JMM.16.4.041011

Received: 13 July 2017; Accepted: 24 October 2017; Published: 24 November 2017

ACCESS THE FULL ARTICLE

JOURNAL ARTICLE
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY