The Journal of Micro/Nanopatterning, Materials, and Metrology would like to sincerely thank the following individuals who served as reviewers in 2022. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.
Ravikiran Attota
Ajay Baranwal
William Barletta
John Biafore
Daisuke Bizen
Barak Bringoltz
Robert Bristol
Timothy Brunner
Yang Bu
Benjamin Buckner
Ralf Buengener
Anatoly Burov
Sonia Castellanos
Aron Cepler
Narendra Chaudhary
Minfeng Chen
Jeongsub Choi
Jin Choi
Jennifer Church
Will Conley
Vassilios Constantoudis
Charlotte Cutler
Anuja De Silva
Danilo De Simone
Arie Den Boef
Jingyuan Deng
Bappaditya Dey
Alain Diebold
Ilan Englard
Andreas Erdmann
Peter Evanschitzky
Nelson Felix
Jo Finders
Donis Flagello
Guillaume Freychet
Thomas Germer
Dario Goldfarb
Yuri Granik
Steven Grzeskowiak
Douglas Guerrero
Dandan Han
Carsten Hartig
Craig Higgins
Ulrich Hofmann
Stephen Hsu
Osamu Inoue
Nathan Ip
Toshiro Itani
Konstantins Jefimovs
Chih-Ming Ke
R. Kline
Shinji Kobayashi
Roman Kris
Takanori Kudo
Roderick R. Kunz
Bertrand Le Gratiet
Philippe Leduc
Zachary Levinson
Scott Lewis
Ted Liang
Fei Liu
Peng Liu
Kenneth Luey
Chris Mack
Mohammad Hossein Mahdieh
Theodore Manouras
Lawrence Melvin, III
Hazem Mesilhy
Iacopo Mochi
Gangadhara Raja Muthinti
Seiji Nagahara
George Neil
Toan Nguyen
Yaw Obeng
Michio Ohashi
Takeyoshi Ohashi
Ndubuisi Orji
George Papavieros
Brennan Peterson
Thomas Pistor
Michael Postek
Jerome Reche
Alex Robinson
Lucia Romano
Mohamed Saib
Mohammad Saifullah
Julius Joseph Santillan
Serap Savari
Helmut Schift
Kazunori Seki
Jae Hwan Sim
Nigel Smith
Daniel Sunday
Kiyoshi Takamasu
Edita Tejnil
Jim Thackeray
Peter Trefonas
Sagar Trivedi
Kuen-Yu Tsai
Alessandro Vaglio Pret
Luc Van Kessel
Pradeep Vukkadala
Liyuan Wang
Takeo Watanabe
Donald Windover
Richard Winpenny
Jack Wong
Shang-Jung Wu
Kenji Yamazoe
Haoyu Yang
Shuji Ye
Zhengmao Ye
Changsheng Ying
Alexander Ypma
Bei Yu
Libin Zhang
Joerg Zimmermann