Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio

Alexander V. Tavrov; Michael Totzeck; Norbert Kerwien; Hans J. Tiziani

doi:10.1117/1.1490589

1 August 2002 Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio

Alexander V. Tavrov, Michael Totzeck, Norbert Kerwien, Hans J. Tiziani

Author Affiliations +

Optical Engineering, Vol. 41, Issue 8, (August 2002). https://doi.org/10.1117/1.1490589

The signal-to-noise ratio required to obtain 10-nm accuracy in the measurement of lateral position is studied with an interference microscope. Evaluations are performed using the rigorous coupled-wave analysis (RCWA) modal approach and Hopkins image formation theory.

©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Alexander V. Tavrov, Michael Totzeck, Norbert Kerwien, and Hans J. Tiziani "Rigorous coupled-wave analysis calculus of submicrometer interference pattern and resolving edge position versus signal-to-noise ratio," Optical Engineering 41(8), (1 August 2002). https://doi.org/10.1117/1.1490589

Published: 1 August 2002

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available