Dr. Andrew Skumanich
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 29 April 2004 Paper
Sang Hong, Gary May, John Yamartino, Andrew Skumanich
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536870
KEYWORDS: Neural networks, Principal component analysis, Data modeling, Data acquisition, Etching, Plasma etching, Process modeling, Process control, Semiconductors, Reactive ion etching

Proceedings Article | 29 April 2004 Paper
David Mui, Hiroki Sasano, Wei Liu, John Yamartino, Andrew Skumanich
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537444
KEYWORDS: Etching, Semiconducting wafers, Process control, Metrology, Critical dimension metrology, Scatterometry, Data modeling, Optical lithography, Feedback loops, Control systems

Proceedings Article | 12 July 2002 Paper
Ramakrishna Akella, Kristin Fridgeirsdottir, Andrew Skumanich
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475645
KEYWORDS: Inspection, Semiconducting wafers, Process control, Metals, Scanning electron microscopy, Resistance, Particles, Metrology, Etching, Tolerancing

Proceedings Article | 12 July 2002 Paper
Andrew Skumanich, Elmira Ryabova
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475646
KEYWORDS: Particles, Semiconducting wafers, Inspection, Oxides, Aluminum, Dielectrophoresis, Etching, Copper, Silica, Silicon

Proceedings Article | 23 April 2001 Paper
Andrew Skumanich, Elmira Ryabova
Proceedings Volume 4406, (2001) https://doi.org/10.1117/12.425268
KEYWORDS: Particles, Semiconducting wafers, Inspection, Oxides, Silicon, Etching, Statistical analysis, Wafer-level optics, Copper, Dielectrophoresis

Showing 5 of 20 publications
Conference Committee Involvement (4)
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Data Analysis and Modeling for Process Control II
3 March 2005 | San Jose, California, United States
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Process and Materials Characterization and Diagnostics in IC Manufacturing II
27 February 2003 | Santa Clara, CA, United States
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