A magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postrocessed witha code that caluculated the radiation spectrum from Xe ions, including 13.4-nm EUV output, based on a detailed collisional-radiative atomic kinetics model. A variety of gas discharges relevant to microlithography can be modeled with this new tool.
A radiation-magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postprocessed with a code that calculates the 13.4-nm EUV radiation output from Xe ions, based on a detailed collisional-radiative atomic kinetics model. Modeling of a dense plasma focus discharge, in a Xe-He gas mixture, has been initiated with this new tool.
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