Dr. David Y. Chan Profile

Dr. David Y. Chan

Member/Technical Staff at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 16 April 2012 Open Access

Mask industry assessment trend analysis: 2012

Y. David Chan

Proceedings Volume 8352, 835203 (2012) https://doi.org/10.1117/12.923746

KEYWORDS: Photomasks, Binary data, Phase shifts, Data processing, Optical proximity correction, Microelectronics, Databases, Neodymium, Lithography, Pellicles

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Proceedings Article | 14 October 2011 Paper

Mask Industry Assessment: 2011

Y. David Chan

Proceedings Volume 8166, 81660D (2011) https://doi.org/10.1117/12.897308

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Photomask technology, Glasses, Data processing, Inspection, Data conversion, Microelectronics

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Proceedings Article | 2 April 2011 Paper

EUV mask readiness and challenges for the 22nm half pitch and beyond

Y. David Chan

Proceedings Volume 7985, 79850A (2011) https://doi.org/10.1117/12.896913

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Defect inspection, Particles, Extreme ultraviolet lithography, Electromagnetic coupling, Reflectivity, Reticles, Semiconducting wafers

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Proceedings Article | 17 March 2011 Paper

The 2002 to 2010 mask survey trend analysis

Greg Hughes, David Chan

Proceedings Volume 7985, 798502 (2011) https://doi.org/10.1117/12.896880

KEYWORDS: Photomasks, Pellicles, Binary data, Optical proximity correction, Data processing, Manufacturing, Phase shifts, Microelectronics, Glasses, Printing

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Proceedings Article | 25 September 2010 Paper

Mask Industry Assessment: 2010

Greg Hughes, David Chan

Proceedings Volume 7823, 782303 (2010) https://doi.org/10.1117/12.868465

KEYWORDS: Photomasks, Microelectronics, Data processing, Photomask technology, Current controlled current source, Semiconductors

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Proceedings Article | 23 March 2010 Paper

The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

Patrick Naulleau, Christopher Anderson, Lorie-Mae Baclea-an, David Chan, Paul Denham, Simi George, Kenneth Goldberg, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Brittany McClinton, Ryan Miyakawa, Warren Montgomery, Seno Rekawa, Tom Wallow

Proceedings Volume 7636, 76361J (2010) https://doi.org/10.1117/12.848438

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Printing, Phase shifts, Lithographic illumination, Extreme ultraviolet lithography, Image resolution, Mask cleaning, Resolution enhancement technologies

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Proceedings Article | 20 March 2010 Paper

EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing

Y. David Chan, Abbas Rastegar, Henry Yun, E. Steve Putna, Stefan Wurm

Proceedings Volume 7636, 76361D (2010) https://doi.org/10.1117/12.847371

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect inspection, Optical inspection, Particles, Reflectivity, Manufacturing, Deep ultraviolet

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Proceedings Article | 30 October 2007 Paper

Study of time dependent 193 nm reticle haze

Joseph Gordon, Larry Frisa, Christian Chovino, David Chan, John Keagy, Colleen Weins

Proceedings Volume 6730, 67301E (2007) https://doi.org/10.1117/12.747145

KEYWORDS: Air contamination, Reticles, Photomasks, Humidity, Contamination, Inspection, Atmospheric particles, Semiconducting wafers, Data modeling, Semiconductors

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Proceedings Article | 11 May 2007 Paper

Influence of environmental components on haze growth

Joseph Gordon, David Chan, Larry Frisa, Colleen Weins, Christian Chovino, John Keagy, Steve Mahoney, Frank Chen, Makoto Kozuma, Kyoko Kuroki, Takahiro Matsuura

Proceedings Volume 6607, 660707 (2007) https://doi.org/10.1117/12.728920

KEYWORDS: Air contamination, Photomasks, Reticles, Pellicles, Atmospheric particles, Sulfur, Gases, Nitrogen, Semiconducting wafers, Semiconductors

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Proceedings Article | 12 May 2005 Paper

The effect of polarized 193nm irradiation on photomask haze formation

Y. Kim, H. Kang, Yuan Zhang, Chuong Tran, Nigel Farrar, Jennifer Qin, Barry Rockwell, H. Cho, Rand Cottle, David Chan, Pat Martin, S. Choi, Chris Progler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598913

KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners

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SPIE Journal Paper | 1 July 2003

Cr photomask etch

Banqiu Wu, David Chan

JM3, Vol. 2, Issue 03, (July 2003) https://doi.org/10.1117/12.10.1117/1.1580828

KEYWORDS: Etching, Chromium, Photomasks, Critical dimension metrology, Cadmium, Photoresist processing, Plasma etching, Plasma, Ions, Oxygen

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Proceedings Article | 2 June 2003 Paper

Cr and MoSi photomask plasma etching

Banqiu Wu, David Chan

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483666

KEYWORDS: Etching, Chromium, Photomasks, Critical dimension metrology, Plasma etching, Plasma, Metrology, Scanning electron microscopy, Photoresist processing, Cadmium

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SPIE Journal Paper | 1 January 2003

MoSi etch of phase-shift masks

Banqui Wu, David Chan

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1530570

KEYWORDS: Etching, Chromium, Plasma, Plasma etching, Ions, Diffractive optical elements, Critical dimension metrology, Oxygen, Cadmium, Electrons

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Proceedings Article | 27 December 2002 Paper

Cr photomask etch performance and its modeling

Banqiu Wu, David Chan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467581

KEYWORDS: Etching, Chromium, Photomasks, Plasma etching, Plasma, Cadmium, Photoresist processing, Critical dimension metrology, Chlorine, Ions

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Proceedings Article | 11 March 2002 Paper

Photomask blank shelf-life study on e-beam chemically amplified resists

Feng Qian, David Chan, Masahiko Ishizuka, Akira Kurabayashi, Takumi Ogawa, Ryoichi Kobayashi, Takaei Sasaki

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458337

KEYWORDS: Photomasks, Packaging, Compact discs, Critical dimension metrology, Chemically amplified resists, Thin film coatings, Scanning electron microscopy, Environmental sensing, Polymers, Control systems

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Proceedings Article | 11 March 2002 Paper

Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node

Peter Rhyins, Michael Fritze, David Chan, Chris Carney, B. Blachowicz, Marco Vieira, Chris Mack

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458325

KEYWORDS: Photomasks, Quartz, Etching, Lithography, Semiconducting wafers, Metrology, Critical dimension metrology, Tolerancing, Reticles, Profilometers

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Proceedings Article | 14 September 2001 Paper

100-nm node lithography with KrF?

Michael Fritze, Brian Tyrrell, David Astolfi, Donna Yost, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, Hua-Yu Liu, M. Ma, David Chan, Peter Rhyins, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435719

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Optics manufacturing, Image processing, Scanning electron microscopy, Double patterning technology, Etching

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Proceedings Article | 22 January 2001 Paper

Minimization of mask transmission asymmetry effect for chromeless phase-shift masks

David Chan, Justin Novak, Michael Fritze

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410678

KEYWORDS: Photomasks, Diffusion, Diffraction, Mask making, Etching, Coherence (optics), Electromagnetic simulation, Phase shifts, Electromagnetism, Diffraction gratings

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Proceedings Article | 5 July 2000 Paper

Application of attenuated phase-shift masks to sub-0.18-um logic patterns

Michael Fritze, Peter Wyatt, David Astolfi, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, David Chan, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388955

KEYWORDS: Photomasks, Logic, Lithographic illumination, Image processing, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Scanning electron microscopy, Semiconductors

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Proceedings Article | 30 December 1999 Paper

Incorporation of laser proximity correction into mask production

Anja Rosenbusch, James Unruh, Hartmut Kirsch, David Chan

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373347

KEYWORDS: Photomasks, Optical proximity correction, Mask making, Opacity, Reticles, Semiconducting wafers, Inspection, Image quality standards, Scanning electron microscopy, Computer aided design

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Proceedings Article | 25 August 1999 Paper

Advanced high-resolution mask processes using optical proximity correction

Y. David Chan

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360199

KEYWORDS: Etching, Photomasks, Optical proximity correction, Reticles, Dry etching, Wet etching, Lithography, Distortion, Semiconducting wafers, Image processing

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Proceedings Article | 1 June 1992 Paper

Correlation of 150-mm silicon wafer site flatness with stepper performance for deep submicron applications

Howard Huff, Joseph Vigil, Birol Kuyel, David Chan, Long Nguyen

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59805

KEYWORDS: Semiconducting wafers, Deep ultraviolet, Metrology, Critical dimension metrology, Integrated circuits, Inspection, Process control, Silicon, Polishing, Oxidation

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Showing 5 of 23 publications

Conference Committee Involvement (2)

Photomask Technology

13 September 2010 | Monterey, California, United States

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

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