Mr. David J. Pinckeny Profile

David J. Pinckeny

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Study of high throughput EUV mask pattern defect inspection technologies using multibeam electron optics

Hidekazu Takekoshi, Riki Ogawa, John Hartley, David Pinckeny, Atsushi Ando, Koichi Ishii, Chosaku Noda, Tadayuki Sugimori, Nobutaka Kikuiri

Proceedings Volume 11611, 116112N (2021) https://doi.org/10.1117/12.2583613

KEYWORDS: Photomasks, Extreme ultraviolet, Optics manufacturing, Inspection, EUV optics, Defect inspection, Extreme ultraviolet lithography, Semiconductor manufacturing, Optical systems, Optical inspection

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years