Ms. Gerda Ekindorf Profile

Gerda Ekindorf

at Heidelberg Instruments Mikrotechnik GmbH

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Author

Publications (3)

Proceedings Article | 9 April 2024 Presentation + Paper

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Christine Schuster, Marina Heinrich, Anja Voigt, Andrew Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12956, 129560H (2024) https://doi.org/10.1117/12.3010852

KEYWORDS: Film thickness, Photoresist materials, Lithography, Ultraviolet radiation, Binary data, Grayscale lithography, Standards development, Optical lithography, Glasses, Photomasks

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Proceedings Article | 1 May 2023 Presentation + Paper

Ultra-thick positive photoresist layers for maskless grayscale lithography

Dominique Collé, Gerda Ekindorf

Proceedings Volume 12497, 124970O (2023) https://doi.org/10.1117/12.2658355

KEYWORDS: Maskless lithography, Direct write lithography, 3D microstructuring, Photoresist materials, Grayscale lithography, Equipment, Coating, Micro optics, Photoresist processing, Lithography

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Proceedings Article | 1 May 2023 Paper

Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist

Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner

Proceedings Volume 12497, 124970P (2023) https://doi.org/10.1117/12.2661526

KEYWORDS: Light emitting diodes, Photoresist materials, Grayscale lithography, Bubbles, Ultraviolet radiation, Light absorption, Optical lithography, Coating, Picture Archiving and Communication System

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