Al2O3/ZrO2 multilayers have been deposited on Si(100) substrates by reactive pulsed laser deposition
technique. The experiments were performed at an optimized oxygen partial pressure of 3x10-2 mbar at room
temperature. A nanolaminate structure consisting of alternate layers of ZrO2 and Al2O3 with 40 bi-layers were
fabricated with thickness of each layer of zirconia and alumina of 15 nm and 5 nm, respectively. The cross-sectional
transmission electron microscope (XTEM) investigations were carried out on a multilayer thin film deposited at room
temperature. The XTEM study shows the formation of uniform thickness, higher fraction of monoclinic and small
fraction of tetragonal phases of zirconia and amorphous alumina. The ZrO2 /Al2O3 multilayer film was characterized
using high temperature x-ray diffraction (HTXRD) in the temperature range RT-1473 K. The ZrO2 /Al2O3 multilayer
shows a crystallization temperature of 673 K for the formation of tetragonal and monoclinic phases with significant
amount of tetragonal phase over the latter. From the HTXRD profiles, crystallite size, lattice parameters, and thermal
expansion coefficient of the tetragonal phase were calculated.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.