Gyeongseok Park
at SAMSUNG Electronics Co., Ltd.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Paper
Proceedings Volume 12953, 1295309 (2024) https://doi.org/10.1117/12.3010718
KEYWORDS: Extreme ultraviolet, Mirrors, Light sources and illumination, Semiconducting wafers, Simulations, Nanoimprint lithography, Metrology, Critical dimension metrology, Source mask optimization, Phase shifts

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