Degradation and resulting photo luminescence (PL) are sometimes induced by irradiation with UV lasers. The mechanisms of the degradation are dependent on the grades of silica glass and their production conditions. In this study, relationship between degradation phenomena and photo luminescence during the laser irradiation of pulsed 266 nm was evaluated with several glades of silica glass.
Synthetic fused silica containing ca. 1000 ppm of OH (ES), silica glass produced from synthetic silica powder melted with oxy-hydrogen flame (S), and plasma torch (SD) were used for this measurement. Pulsed 266 nm laser with 80 kHz was irradiated at the inside of silica glass by using lens with a focal length of 50 mm. Degradation at the focused area was observed from the transmitted laser power. PL from the focused area was also detected with a spectrometer. SD needs nine times longer time for degradation than ES. PL around 640 nm related to the NBOHC (SiO) was gradually increased with degradation change, and rapidly increased when the laser damage occurred at the focused area. The mechanism of the degradation during the laser irradiation of pulsed 266 nm will be presented.
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