Texas Instrument's spatial light modulator chip, the DMD (digital micromirror device, the central chip in all DLP
based systems) has been used in multiple maskless lithography applications for the past 5-7 years. Typically these
applications have been focused on PCB lithography. Applications using illumination below 320nm have not been feasible due to shortened lifetime of the device at shorter wavelengths. Recent advances in DMD processing have made significant improvements in the operational lifetime of the DMD. This paper will cover the background of UV-A DMD maskless lithography and demonstrate the increased lifetime at 311nm and 266nm with the new processes.
Conference Committee Involvement (2)
Emerging Digital Micromirror Device Based Systems and Applications IV
23 January 2012 | San Francisco, California, United States
Emerging Digital Micromirror Device Based Systems and Applications III
26 January 2011 | San Francisco, California, United States
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