As the augmented reality (AR) market matures and production volumes increase, the yield and process stability of imprinted waveguides become increasingly critical. This presentation will explore how Inkron has leveraged advanced optical materials to optimize the nanoimprint lithography (NIL) process, resulting in improved yield, process stability, and optical performance. Simultaneously, we will showcase how these material advancements enhance optical clarity and contrast, enabling the creation of more immersive and realistic AR experiences.
The article gives two examples of the incorporation of liquid phase coated low refractive index (RI) and high refractive index materials in a proof-of-concept optical devices. Using ultra low RI (1.25) and ultra high RI (2.05), a 12-layer dielectric mirror is constructed. Optical properties of the stack are compared against to simulations, and a SEM-image of the stack is provided. The second example of using of high RI/low RI materials is provided where UV-curable, high RI material (1.9) nanoimprint material is nanopatterned, followed by gap-fill and protections by a cover glass using a dual cure (UV+thermal) RI 1.4 low refractive index bonding adhesive.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.