Ms. Juliet Miao Profile

Juliet Miao

at Western Digital

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Publications (2)

Proceedings Article | 1 April 2008 Paper

Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond

Xiangqun Miao, Lior Huli, Hao Chen, Xumou Xu, Hyungje Woo, Chris Bencher, Jen Shu, Chris Ngai, Christopher Borst

Proceedings Volume 6924, 69240A (2008) https://doi.org/10.1117/12.772024

KEYWORDS: Double patterning technology, Etching, Lithography, Amorphous silicon, Scanning electron microscopy, Tin, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Extreme ultraviolet

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Proceedings Article | 27 March 2007 Paper

RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development

Xiangqun Miao, Xumou Xu, Yongmei Chen, Chris Ordonio, Chris Bencher, Chris Ngai

Proceedings Volume 6520, 65201F (2007) https://doi.org/10.1117/12.707782

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Etching, Resolution enhancement technologies, Double patterning technology, Scanning electron microscopy, Semiconducting wafers, Neodymium, Data modeling

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