Dr. Kenichi Saito Profile

Dr. Kenichi Saito

Chief Specialist at NuFlare Technology Inc

SPIE Involvement:

Author

Proceedings Article | 25 October 2016 Paper

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara

Proceedings Volume 9985, 998508 (2016) https://doi.org/10.1117/12.2242987

KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

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Proceedings Article | 17 October 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 9235, 92350X (2014) https://doi.org/10.1117/12.2065551

KEYWORDS: Photomasks, Electron beam melting, Electron beams, Data conversion, Amplifiers, LCDs, Mask making, Seaborgium, Beam shaping

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Proceedings Article | 28 July 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 9256, 925607 (2014) https://doi.org/10.1117/12.2065230

KEYWORDS: Photomasks, Electron beam melting, Amplifiers, Electron beams, Logic, LCDs, Mask making, Objectives, Vestigial sideband modulation

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Proceedings Article | 9 September 2013 Paper

Turret-type electron gun for EBM-8000

Nobuo Miyamoto, Rodney Kendall, Kenichi Saito

Proceedings Volume 8880, 88801G (2013) https://doi.org/10.1117/12.2027456

KEYWORDS: Electron beams, Photomasks, Power supplies, Electrodes, Protactinium, Temperature metrology, Manufacturing, Semiconductors, Photomask technology, Current controlled current source

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Proceedings Article | 14 October 2011 Paper

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 8166, 81661D (2011) https://doi.org/10.1117/12.898850

KEYWORDS: Photomasks, Lithography, Amplifiers, Data storage servers, Mask making, Immersion lithography, Data conversion, Extreme ultraviolet lithography, Data processing, Data corrections

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Proceedings Article | 21 July 2000 Paper

Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama, Hajime Aoyama, Shinji Tsuboi, Hiroshi Watanabe, Yukiko Kikuchi, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Kenichi Saito, Shigehisa Ohki, Tadahito Matsuda

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390033

KEYWORDS: Photomasks, X-rays, Image processing, Distortion, Silicon carbide, Silicon, Lithography, Mask making, X-ray lithography, Interferometers

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Proceedings Article | 25 October 1996 Paper

100-kV electron gun for the x-ray mask writer EB-X2

Kenichi Saito, Junichi Kato, Nobuo Shimazu, Akira Shimizu

Proceedings Volume 2858, (1996) https://doi.org/10.1117/12.255500

KEYWORDS: Ray tracing, X-rays, Electron beams, Electrodes, Photomasks, Optical design, Geometrical optics, Silicon, Scanning electron microscopy, X-ray lithography

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Proceedings Article | 25 September 1995 Paper

New design for a field emission electron gun immersed in a magnetic lens field

Kenichi Saito, Hirofumi Morita, Nobuo Shimazu, Yasumichi Uno

Proceedings Volume 2522, (1995) https://doi.org/10.1117/12.221572

KEYWORDS: Magnetism, Ray tracing, Monochromatic aberrations, Electrodes, Prototyping, Chromatic aberrations, Optical properties, Charged particle optics, Electron beams, Spherical lenses

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Showing 5 of 9 publications

Conference Committee Involvement (3)

Photomask Technology 2015

29 September 2015 | Monterey, California, United States

Photomask Technology 2014

16 September 2014 | Monterey, California, United States

SPIE Photomask Technology

10 September 2013 | Monterey, California, United States

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