Ken Ando
at Tokyo Electron Europe Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12957, 129571W (2024) https://doi.org/10.1117/12.3010713
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Plasma etching, Photoresist materials, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

Proceedings Article | 22 November 2023 Poster
Proceedings Volume PC12750, PC1275011 (2023) https://doi.org/10.1117/12.2687568
KEYWORDS: Extreme ultraviolet, Etching, Plasma etching, Photoresist materials, Optical lithography, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

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