Dr. Klaus W. Lowack Profile

Dr. Klaus W. Lowack

at Siemens AG

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Author

Publications (5)

Proceedings Article | 24 March 2006 Paper

Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

Patrick Naulleau, Kim Dean, Klaus Lowack

Proceedings Volume 6151, 61512T (2006) https://doi.org/10.1117/12.657001

KEYWORDS: Extreme ultraviolet, Data modeling, Extreme ultraviolet lithography, Optics manufacturing, Contrast transfer function, Wavefronts, Photomasks, Electroluminescence, Lithography, Cadmium

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Proceedings Article | 24 March 2006 Paper

The EUV resist test center at Sematech-North

Klaus Lowack, Andy Rudack, Kim Dean, Matt Malloy, Mike Lercel

Proceedings Volume 6151, 61512U (2006) https://doi.org/10.1117/12.657683

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Real-time computing, Photoresist materials, Lithography, Photoresist developing, Contamination, Line edge roughness, Reticles

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Siegfried Schwarzl, Frank-Michael Kamm, Stefan Hirscher, Klaus Lowack, Wolf-Dieter Domke, Markus Bender, Stefan Wurm, Adam Pawloski, Bruno La Fontaine, Christian Holfeld, Uwe Dersch, Florian Letzkus, Joerg Butschke

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 4 May 2005 Paper

Comparison of resist outgassing at wavelengths from 193 nm to 13 nm

Wolf-Dieter Domke, Karl Kragler, Marion Kern, Klaus Lowack, Oliver Kirch, Michele Bertolo

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599543

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Spectroscopy, Synchrotrons, Ions, Chromatography, Diffusion, Molecules, 193nm lithography

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Adam Pawloski, Bruno La Fontaine, Harry Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, Patrick Naulleau, Florian Letzkus, Joerg Butschke

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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