This paper describes the design of the developed sensing element (SE) of a micromechanical accelerometer (MMA). Devices using SE data are used to measure acceleration (apparent). SE MMA is manufactured using a technology based on operations that make up the technology of semiconductors, mainly silicon, devices, and integrated circuits. But it has a number of significant features and problems that have to be taken into account when using typical technological processes for specific micromechanical structures and systems.
The paper considers the process of anisotropic etching of silicon, which makes it possible to form a three-dimensional SE structure. A numerical estimate of the errors arising during the formation of protrusions that form the gap is given. And even the influence of these errors on the output parameters of the MMA.
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