Optical lithography with high numerical aperture has a significant modulation effect on the polarization state of the light field, which affects the imaging quality of the system. Due to the selectivity of the optical system to the polarization state, incident different polarized light fields will change the imaging quality of the system. Therefore, studying the influence of the lithography system on the polarized light field is helpful to improve the imaging quality. The polarization effect of lithography system is calculated based on polarization ray tracing method in this paper. The polarization state changes of incident scalar light field and vector light field are analyzed, and the ellipticity and azimuth on the exit pupil of system is calculated.
We propose a new optical engine that supresses stray light to address the problems of high stray background light and low star point simulation in traditional star simulators and offer an experimental proof that the new design provides higher contrast. Our design incorporates an optical collimator with a modulation frequency transfer function (MTF) greater than 0.6 at a cut-off frequency of 60 lp/mm that meets star point identification requirements. Experimental results show the background noise of the high contrast star simulator to be well suppressed, providing a 3.16-fold reduction in stray light compared with a traditional system.
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